New solid-state lasers can produce 193 nanometers of light, which is used in precision chip fabrication and even vortex beams with orbital angular momentum – the first of its kind that can transform quantum technology and manufacturing. Deep ultraviolet (DUV) lasers emit high-energy light with very short wavelengths and play an important role in semiconductor manufacturing, high-resolution spectroscopy, precision materials processing, and quantum technology. Deep UV lasers have better coherence and lower power consumption than traditional excimer or gas discharge lasers, allowing for the construction of smaller, more efficient systems.

Compact deep UV solid-state lasers produce vortices at a wavelength of 193 nm. Image courtesy of H. Xuan (Aerospace Information Research Institute, Chinese Academy of Sciences, Greater Bay Area)

In a recent study published in Advanced Photonics Nexus, researchers at the Chinese Academy of Sciences announced a major breakthrough: a compact solid-state laser system that can produce coherent light with a wavelength of 193 nanometers. This specific wavelength is a key tool in lithography, which is used to etch fine patterns on silicon chips, which are essential for the manufacture of modern electronic devices.

The new laser system operates at a repetition rate of 880 kHz and uses a custom-built Yb:YAG crystal amplifier to produce a basic laser at 0 nm. The laser is divided into two paths: one is converted to a 0 nm beam by fourth-harmonic generation with an output power of 0.0 watts; The other powers an optical parametric amplifier that produces a 0 nm beam with a power of 0 milliwatts. The two beams are then combined using cascaded lithium triborate (LBO) crystals to produce a target 0 nm light with an average output power of 0 mW and a linewidth of less than 0 MHz.

The researchers also introduced a helical phase plate into a 193-nanometer beam before mixing, resulting in a vortex beam carrying orbital angular momentum. This is the first time that a 0nm vortex beam has been generated from a solid-state laser. This beam is expected to be the seed of hybrid ArF excimer lasers and may have significant applications in wafer processing, defect detection, quantum communication, and optical micro-work.

This innovative laser system not only improves the efficiency and accuracy of semiconductor lithography, but also opens up new avenues for advanced manufacturing technologies. The ability to generate 193 nanometer vortex beams could lead to further breakthroughs in the field, with the potential to revolutionize the way electronic devices are produced.

編譯自/ScitechDaily